Product description

This is a shield with an engraved pattern that selectively transmits light.

Several circuits and patterns can be formed using photo masks.

Photo masks are used as a substrate for microcircuits during the production of semiconductor integrated circuits (LSI), flat panel displays (LCDs, OLEDs), and printed circuit boards (PCBs).

Product Inquiry

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Features

대면적
Large Area Coverage
초정밀
Ultraprecision
저비용
Low Cost
    Implementation of high precision pattern

    Fine CD: Chrome 0.6 µm, Space 1.0 µm

    Transmittance control: 4% - 55%

    Development of the original large area photo mask

    Available mask for the world's first 8.5 generation: 1,220 mm × 1,400mm(13 t)

    We have secured ownership for technologies such as Quartz Polishing, Cr sputtering, and PR Coating.

    Developed the world's first Large Area Pattern Generator

Product Type

Category Specifications
Binary Mask CD Tolerance ≤ ± 0.20 µm, Range ≤ 0.25 µm
Fine-Slit Mask CD Tolerance ≤ ± 0.10 µm, Range ≤ 0.10 µm
Half-tone Mask Transmittance Tolerance ≤ ± 1%
Uniformity ≤ 2%
Multi-tone Mask Transmittance Target: 4% - 55% (3-tone or over)

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